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Hi,

I don't think you have to worry about this.

Please use a mask during refinement and apply "solvent-flattened FSC".

Best regards,

Takanori Nakane

> Hi Takanori,
> Please find my postprocess.star file attached.
> Best,
> Yangqi
>
> Sent from Mail for Windows 10
>
> From: Takanori Nakane
> Sent: Wednesday, August 7, 2019 12:05 PM
> To: Yangqi Gu
> Cc: [log in to unmask]
> Subject: Re: [ccpem] Dipping in FSC
>
> Hi,
>
> Please post your postprocess.star.
>
> In general, some fluctuation in FSC is not uncommon in filament
> processing, because of layer lines.
>
> Best regards,
>
> Takanori Nakane
>
>> Dear RELION developers,
>> I am doing a helical refinement and noticed a warning happening once
>> during the early stage of refinement (FSC dipping below 0.5 and rise
>> again), although not persistent. But when I plotted the final FSC
>> (unmasked), I did see a dipping around 0.5 A (although it might not
>> affect
>> the resolution estimate after postprocessing since the inflation caused
>> the dipping at higher FSC?) I am wondering how this FSC dipping will
>> affect the final map? Will it cause the wrong weighting when applying
>> the
>> Wiener filter (since SSNR is estimated from FSC, I assume)?I am doing a
>> helical reconstruction, so I used 90% of the box size as a mask, plus a
>> cylindrical mask (100 A) and the diameter of my filament is ~65 A. Is
>> this
>> mask still too tight? I do have some random small particles in the
>> background (not ice contamination, but other proteins). Could this be
>> the
>> reason since the solvent is not technically flat (I tried avoid those
>> particles during manual picking, but may not guarantee a total clean
>> background)?
>> Yangqi
>>
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>
>
>
>

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