DOCTORAL STUDENT IN LASER NANOPROCESSING AND DEPOSICIÓN OF NANOSTRUCTURES
The Group of Laser Ablation and Deposition of the Instituto de Química
Física Rocasolano, belonging to the Spanish National Research Council
Council (CSIC) will be adding one postgraduate student (leading to a PhD
degree). The group particularly focuses on laser processing, ablation and
deposition.
Laser ablation has shown itself as one of the most efficient physical
methods for micro, and more recently, nanofabrication, due to the high
resolution capability, low heat deposition in the target and high level of
flexibility. On the other hand, the ablation of the target yields to an
ejection of its constituents and to the formation of nanoclusters and
nanostructures on pulsed laser deposition processes. When the target is
ablated in vacuum or in a residual gas, the nanoclusters can be deposited on
a substrate, placed at some distance from the target, leading to the
formation of a nanostructured film. The properties of synthesized
nanostructures can be efficiently controlled by parameters of laser ablation
(fluence, pulse duration, wavelength) and properties of the environment.
These processes are investigated experimentally using laser pulses of
nanosecond and femtosecond duration and methodologies that include the
analysis of the ablation plume by mass spectrometry and optical emission
spectroscopy and of the nanostructured deposits by atomic force and scanning
electron microscopies, XPS, XRD, etc.
If you are interested in pursuing a PhD degree in the field mentioned send
an email stating this to [log in to unmask] position will be
formally announced in January, 2008. General information about the group is
available at:
http://www.iqfr.csic.es/ql/Web_QL_english/Ablacion_laser.htm
Dr. Marta Castillejo
Instituto de Química Física Rocasolano, CSIC
Serrano 119, 28006 Madrid
Tel.: 34-91-5619400, ext. 1218
Fax: 34-91-5642431
e-mail: [log in to unmask]
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